Manufacturing innovation trends in the semiconductor, solar, flat panel display, and disk drive industries are driving the need for better process control, increasing the demand for Entegris – Jetalon's products.
Applications for liquid concentration monitoring span the range of processes required in liquid chemical systems in Micro-electronics and related markets, and Entegris – Jetalon tools have a place in all of them.
CR-288 is now the Micro-electronics industry's de facto concentration monitoring system for hydrogen peroxide in CMP slurries.
CR-288 is used for liquid concentration monitor and control in all wet processing areas including Front-End-of-Line and Back-End-of-Line surface preparation (SC1, SC2, hydrofluoric acid, BOE, EKC and ATMI chemicals, IPA, organic acids), photolithography (TMAH and photoresist), CMP (slurry, hydrogen peroxide) and post-CMP cleans.
See CR-288 for implementation diagrams and case studies.